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Cotton Inc. Intros New Tech

By Carole Sloan -- Home Textiles Today, 1/9/2006 12:00:00 AM

Frankfurt, Germany — Cotton Inc. will launch three new performance technologies for home textiles at Heimtextil here this week. The technologies will be introduced in the United States during the first quarter of this year.

The first new process for sheets is “endure,” which was derived from the company's Tough Cotton process for apparel, according to David Early, manager, textile market development. The process significantly increases product durability and wear life of sheets — two factors of concern to consumers, Early noted. The “endure” process also offers an improved level of wrinkle resistance, he added.

The second process is “repel,” also an off-shoot from the apparel market, where it was developed to provide another layer of easy care for cotton products. For home textiles, “repel” resists stains and spills, maintains fabric breath-ability and dries faster, Early said.

“Wicking Windows,” the third new process, wicks moisture from the skin and offers faster drying. This moisture management application was designed specifically for the activewear market and translated into applications for the home textiles business, said Ira Livingston, senior vice president.

It allows cotton to naturally wick away moisture from the body and enhance the breathability of the fabric adding an accelerated drying time.

According to Cotton studies, the human body generates about 27 ounces of perspiration in the course of eight hours of sleep. “Wicking Windows” moves the moisture away from the body slowly, and then disperses it.

Currently, Livingston said, three U.S. suppliers are working on “endure” development programs, and one each are working on the “repel” and “Wicking Windows” technology.

Also this week, Dana Poor, trend forecaster, home for Cotton Inc. will present “Home Color Trend Updates for 2007” on Jan. 11, Jan. 13 and Jan. 14 at 10 am, and on Jan. 12 at 2 p.m.

Cotton will be at the combined Cotton/Cotton Council International space at Hall 9.0, C44.

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